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:: News Release ::

January 31st, 2011

SII NanoTechnology Inc.
XYALIS

XYALIS and SII NanoTechnology announce strategic collaboration

Grenoble, France & Chiba, Japan, January 31st, 2011- XYALIS, a leader in Mask Data Preparation software, and SII NanoTechnologyiSIINTj, a leader in Photomask Verification software, announced today that they have signed a strategic cooperation agreement to broaden availability of their Photomask Data Preparation solutions, strengthen worldwide support, and develop a unified front-to-back flow for Photomask design and verification.

According to the new agreement, XYALIS will now distribute and support SIINT's SmartMRC, the fastest state-of-the-art Photomask Rule Checker on the market, both in Europe, from its Grenoble, France, headquarters, and in USA, from its San Jose, CA, office.

To enhance the reliability and automation of advanced Mask Data Preparation flows, XYALIS GTmask, a state-of-the-art Photomask Layout solution, and SmartMRC are now integrated into a proven flow.

This extended cooperation agreement fosters a complete automated solution for photomasks design and verification.

áThe synergy and complementarity of our solutions made us natural partners and the implementation of this agreement was straightforward â, states Eric Beisser, founder and CEO of XYALIS, áThe first responses of our customers quickly confirmed the potential and benefits of this cooperation.â

áOur complementary offerings and the similarity of the technical approach are strong assets for commercial successes in Europe and USA.â Says Tadao Inoue, manager of SIINT.


About XYALIS:
Established in 1998, XYALIS is headquartered in Grenoble, France, and is now the leading specialist in layout finishing and GDSII/OASIS processing software. Designed to solve problems which the major ECAD companies do not address, the range consists of advanced Metal-Filling solutions and Mask Data Preparation flow which provides a suite of fully integrated tools that automate and accelerate the most advanced mask creation processes such as generation of Multi Project Wafers (MPW or Shuttles), generation of complex reticles (Frame generation) and Intuitive mask set layout creation.
Web site: http://www.xyalis.com/


About SIINT:
SIINT is headquartered in Chiba, Japan, and is a solutions company that assists manufacturing industries in key processes including development, production and inspection. SIINT offers solutions that meet customer needs in analysis, measurement and observation. Regarding Photomask manufacturing, SmartMRC contributes to the yield improvement of the mask and shortening the mask manufacturing and the inspection time.

Web site: http://www.siint.com/en/

Please contact us: info@xyalis.com and info@siint.co.jp for more information.

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